[Acquired by Sagantec]

Takumi Technology Corp. provides revolutionary DFM (Design for Manufacturing) tool chain that dramatically reduce the yield ramp up time and the mask cost for the state of the art LSI. In the process node at 130nm or below, the physical design of LSI is already reaching to the optical limitation of the available lithography equipments. To squeeze out the performance of the stepper, LSI vendors must apply quite complicated optical compensation technologies, such as PSM (Phase Shift Mask) and OPC (Optical Proximity Compensation), that drives the mask cost exponentially on the top of naturally inherited challenges to ramp up the yield of super-fine pitch LSI. Takumi Technology owns proprietary technology and know-how to, efficiently optimize the layout design so that it derives silicon with wider process tolerance with minimum cost to produce the optimized mask.